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Seeing the invisible: metrology for extended defects in beyond-silicon semiconductor device structures

Date

2017
Meeting abstract
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dc.contributor.authorSchulze, Andreas
dc.contributor.authorProkhodtseva, Anna
dc.contributor.authorVystavel, Tomas
dc.contributor.authorGachet, David
dc.contributor.authorBerney, Jean
dc.contributor.authorLoo, Roger
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorCaymax, Matty
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.accessioned2021-10-24T13:12:11Z
dc.date.available2021-10-24T13:12:11Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29403
dc.identifier.urlhttps://www.nist.gov/pml/engineering-physics-division/2017-fcmn-presentations
dc.source.conferenceInternational Conference on Frontiers of Characterization and Metrology for Nanoelectronics - FCMN
dc.source.conferencedate21/03/2017
dc.source.conferencelocationMonterey, CA USA
dc.title

Seeing the invisible: metrology for extended defects in beyond-silicon semiconductor device structures

dc.typeMeeting abstract
dspace.entity.typePublication
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