Fabrication and characterization of ternary Cu8SiS6 and Cu8SiSe6 thin film layers for optoelectronic applications

dc.contributor.author	Brammertz, Guy
dc.contributor.author	Vermang, Bart
dc.contributor.author	ElAnzeery, Hossam
dc.contributor.author	Sahayaraj, Sylvester
dc.contributor.author	Ranjbarrizi, Samaneh
dc.contributor.author	Meuris, Marc
dc.contributor.author	Poortmans, Jef
dc.contributor.imecauthor	Brammertz, Guy
dc.contributor.imecauthor	Vermang, Bart
dc.contributor.imecauthor	Meuris, Marc
dc.contributor.imecauthor	Poortmans, Jef
dc.contributor.orcidimec	Brammertz, Guy::0000-0003-1404-7339
dc.contributor.orcidimec	Vermang, Bart::0000-0003-2669-2087
dc.contributor.orcidimec	Meuris, Marc::0000-0002-9580-6810
dc.contributor.orcidimec	Poortmans, Jef::0000-0003-2077-2545
dc.date.accessioned	2021-10-23T10:10:22Z
dc.date.available	2021-10-23T10:10:22Z
dc.date.issued	2016
dc.identifier.issn	0040-6090
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/26379
dc.identifier.url	http://www.sciencedirect.com/science/article/pii/S0040609016305739
dc.source.beginpage	649
dc.source.endpage	654
dc.source.journal	Thin Solid Films
dc.source.volume	616
dc.title	Fabrication and characterization of ternary Cu8SiS6 and Cu8SiSe6 thin film layers for optoelectronic applications
dc.type	Journal article
dspace.entity.type	Publication
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