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Articles
Sidewall crystalline orientation effect on post-treatments for a replacement metal gate bulk fin field effect transistor
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Sidewall crystalline orientation effect on post-treatments for a replacement metal gate bulk fin field effect transistor
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Date
2013
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Lee, Jae Woo
;
Simoen, Eddy
;
Veloso, Anabela
;
Cho, Moon Ju
;
Boccardi, Guillaume
;
Ragnarsson, Lars-Ake
;
Chiarella, Thomas
;
Horiguchi, Naoto
;
Groeseneken, Guido
;
Thean, Aaron
Journal
ACS Applied Materials & Interfaces
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Views
1830
since deposited on 2021-10-21
1
last month
1
last week
Acq. date: 2026-02-25
Citations