Publication:

Sidewall crystalline orientation effect on post-treatments for a replacement metal gate bulk fin field effect transistor

Date

2013
Journal article
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dc.contributor.authorLee, Jae Woo
dc.contributor.authorSimoen, Eddy
dc.contributor.authorVeloso, Anabela
dc.contributor.authorCho, Moon Ju
dc.contributor.authorBoccardi, Guillaume
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorChiarella, Thomas
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorThean, Aaron
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorBoccardi, Guillaume
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecBoccardi, Guillaume::0000-0003-3226-4572
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-21T09:11:33Z
dc.date.available2021-10-21T09:11:33Z
dc.date.issued2013
dc.identifier.issn1944-8244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22661
dc.identifier.urlhttp://pubs.acs.org/doi/abs/10.1021/am403270m
dc.source.beginpage8865
dc.source.endpage8868
dc.source.issue18
dc.source.journalACS Applied Materials & Interfaces
dc.source.volume5
dc.title

Sidewall crystalline orientation effect on post-treatments for a replacement metal gate bulk fin field effect transistor

dc.typeJournal article
dspace.entity.typePublication
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