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Isotropic etches for nanosheet device integration - Wet or dry?

Date

2020
Meeting abstract
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dc.contributor.authorOniki, Yusuke
dc.contributor.authorKenis, Karine
dc.contributor.authorWostyn, Kurt
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorHolsteyns, Frank
dc.contributor.imecauthorOniki, Yusuke
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecOniki, Yusuke::0000-0002-6619-1327
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.date.accessioned2021-10-29T01:33:52Z
dc.date.available2021-10-29T01:33:52Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35672
dc.source.conferenceSurface Preparation and Cleaning Conference 2020 - SPCC
dc.source.conferencedate1/04/2020
dc.source.conferencelocationonline online
dc.title

Isotropic etches for nanosheet device integration - Wet or dry?

dc.typeMeeting abstract
dspace.entity.typePublication
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