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IR-LST a powerful non-invasive tool to observe crystal defects in as-grown silicon, after device processing, and in heteroepitaxial layers
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IR-LST a powerful non-invasive tool to observe crystal defects in as-grown silicon, after device processing, and in heteroepitaxial layers
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1996
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kissinger, G.
;
Vanhellemont, Jan
;
Gräf, D.
;
Claeys, Cor
;
Richter, H.
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2017
since deposited on 2021-09-29
1
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Acq. date: 2026-01-25
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Statistics
Views
2017
since deposited on 2021-09-29
1
last month
Acq. date: 2026-01-25
Citations