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High hole-mobility 65nm biaxially-strained Ge-pFETs: fabrication, analysis and optimization
Publication:
High hole-mobility 65nm biaxially-strained Ge-pFETs: fabrication, analysis and optimization
Date
2010
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Mitard, Jerome
;
De Jaeger, Brice
;
Eneman, Geert
;
Dobbie, Andrew
;
Myronov, M.
;
Kobayashi, Masaharu
;
Geypen, Jef
;
Bender, Hugo
;
Vincent, Benjamin
;
Krom, Raymond
;
Franco, Jacopo
;
Winderickx, Gillis
;
Vrancken, Evi
;
Vanherle, Wendy
;
Wang, Wei-E
;
Tseng, Joshua
;
Loo, Roger
;
De Meyer, Kristin
;
Caymax, Matty
;
Pantisano, Luigi
;
Leadley, David
;
Meuris, Marc
;
Absil, Philippe
;
Biesemans, Serge
;
Hoffmann, Thomas Y.
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1899
since deposited on 2021-10-18
Acq. date: 2025-10-23
Citations
Metrics
Views
1899
since deposited on 2021-10-18
Acq. date: 2025-10-23
Citations