Extreme UV Self-Aligned Double Patterning process optimization for BEOL interconnections on 3nm nodes and beyond

Montero Alvarez, Daniel; Buccheri, Nunzio; Lin, Quyang; Roy, Syamashree; Paolillo, Sara; Wu, Chen; Hermans, Yannick; Decoster, Stefan; Baudemprez, Bart; Finoulst, Jan-Frederik; Lazzarino, Frederic; Park, Seongho; Tokei, Zsolt

doi:10.1117/12.3010454

Publication:

Extreme UV Self-Aligned Double Patterning process optimization for BEOL interconnections on 3nm nodes and beyond

Date

2024

Proceedings Paper

https://doi.org/10.1117/12.3010454

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Montero Alvarez, Daniel

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Finoulst, Jan-Frederik

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Lazzarino, Frederic

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Park, Seongho

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Tokei, Zsolt

Journal

Proceedings of SPIE

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298 since deposited on 2024-06-06

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Acq. date: 2026-03-17

Extreme UV Self-Aligned Double Patterning process optimization for BEOL interconnections on 3nm nodes and beyond

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