Publication:

Extreme UV Self-Aligned Double Patterning process optimization for BEOL interconnections on 3nm nodes and beyond

Date

2024
Proceedings Paper
https://doi.org/10.1117/12.3010454
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dc.contributor.authorMontero Alvarez, Daniel
dc.contributor.authorBuccheri, Nunzio
dc.contributor.authorLin, Quyang
dc.contributor.authorRoy, Syamashree
dc.contributor.authorPaolillo, Sara
dc.contributor.authorWu, Chen
dc.contributor.authorHermans, Yannick
dc.contributor.authorDecoster, Stefan
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorFinoulst, Jan-Frederik
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorPark, Seongho
dc.contributor.authorTokei, Zsolt
dc.contributor.imecauthorWu, Chen
dc.contributor.imecauthorPark, Seongho
dc.contributor.imecauthorMontero Alvarez, Daniel
dc.contributor.imecauthorBuccheri, Nunzio
dc.contributor.imecauthorLin, Quyang
dc.contributor.imecauthorRoy, Syamashree
dc.contributor.imecauthorPaolillo, Sara
dc.contributor.imecauthorHermans, Yannick
dc.contributor.imecauthorDecoster, Stefan
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.imecauthorFinoulst, Jan-Frederik
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecMontero Alvarez, Daniel::0000-0001-9966-0399
dc.contributor.orcidimecPaolillo, Sara::0000-0003-2798-5228
dc.contributor.orcidimecLin, Quyang::0009-0005-4679-4306
dc.contributor.orcidimecRoy, Syamashree::0009-0009-3247-3252
dc.contributor.orcidimecHermans, Yannick::0000-0002-6973-0795
dc.contributor.orcidimecDecoster, Stefan::0000-0003-1162-9288
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.contributor.orcidimecTokei, Zsolt::0000-0003-3545-3424
dc.contributor.orcidimecWu, Chen::0000-0002-4636-8842
dc.contributor.orcidimecPark, Seongho::0000-0002-1058-9424
dc.date.accessioned2025-03-31T13:56:25Z
dc.date.available2024-06-06T18:30:28Z
dc.date.available2025-03-31T13:56:25Z
dc.date.issued2024
dc.identifier.doi10.1117/12.3010454
dc.identifier.eisbn978-1-5106-7223-9
dc.identifier.isbn978-1-5106-7222-2
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43995
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpageArt. 129580D
dc.source.conferenceConference on Advanced Etch Technology and Process Integration for Nanopatterning XIII
dc.source.conferencedateFEB 26-29, 2024
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.numberofpages17
dc.source.volume12958
dc.title

Extreme UV Self-Aligned Double Patterning process optimization for BEOL interconnections on 3nm nodes and beyond

dc.typeProceedings paper
dspace.entity.typePublication
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