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Development of a novel wafer probe for in-situ measurements

Date

2013
Presentation
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dc.contributor.authorEl Otell, Ziad
dc.contributor.authorMarinov, Daniil
dc.contributor.authorBowden, Mark
dc.contributor.authorSamara, Vladimir
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorBraithwaite, Nicholas
dc.contributor.imecauthorEl Otell, Ziad
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.date.accessioned2021-10-21T07:27:57Z
dc.date.available2021-10-21T07:27:57Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22304
dc.source.conferencePlasma Technological Workshop UK
dc.source.conferencedate16/12/2013
dc.source.conferencelocationYork UK
dc.title

Development of a novel wafer probe for in-situ measurements

dc.typeOral presentation
dspace.entity.typePublication
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