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The limitation and optimization of bottom-up growth mode in through silicon via electroplating
Publication:
The limitation and optimization of bottom-up growth mode in through silicon via electroplating
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Date
2015
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Yang, Liu
;
Radisic, Alex
;
Deconinck, Johan
;
Vereecken, Philippe
Journal
Journal of the Electrochemical Society
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1863
since deposited on 2021-10-23
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Acq. date: 2025-12-12
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Metrics
Views
1863
since deposited on 2021-10-23
1
last month
Acq. date: 2025-12-12
Citations