Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Articles
Extreme ultraviolet interference lithography as applied to photoresist studies
Publication:
Extreme ultraviolet interference lithography as applied to photoresist studies
Copy permalink
Date
2009
Journal article
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
19651.pdf
625.36 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Gronheid, Roel
;
Leeson, Michael
Journal
Journal of Micro/Nanolithography, MEMS, and MOEMS
Abstract
Description
Metrics
Views
1915
since deposited on 2021-10-17
1
last month
Acq. date: 2025-12-12
Citations
Metrics
Views
1915
since deposited on 2021-10-17
1
last month
Acq. date: 2025-12-12
Citations