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Articles
Extreme ultraviolet interference lithography as applied to photoresist studies
Publication:
Extreme ultraviolet interference lithography as applied to photoresist studies
Date
2009
Journal article
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19651.pdf
625.36 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Gronheid, Roel
;
Leeson, Michael
Journal
Journal of Micro/Nanolithography, MEMS, and MOEMS
Abstract
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1911
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations
Metrics
Views
1911
since deposited on 2021-10-17
Acq. date: 2025-10-23
Citations