Publication:

Extreme ultraviolet interference lithography as applied to photoresist studies

Date

2009
Journal article
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dc.contributor.authorGronheid, Roel
dc.contributor.authorLeeson, Michael
dc.contributor.imecauthorGronheid, Roel
dc.date.accessioned2021-10-17T22:35:06Z
dc.date.available2021-10-17T22:35:06Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15402
dc.source.beginpage21205
dc.source.issue2
dc.source.journalJournal of Micro/Nanolithography, MEMS, and MOEMS
dc.source.volume8
dc.title

Extreme ultraviolet interference lithography as applied to photoresist studies

dc.typeJournal article
dspace.entity.typePublication
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