Publication:

Performance of a linear single wafer IPA vapour based drying system

Date

2005
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorFyen, Wim
dc.contributor.authorArnauts, Sophia
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorDoumen, Geert
dc.contributor.authorVereecke, Guy
dc.contributor.authorVan Steenbergen, Jan
dc.contributor.authorMertens, Paul
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorDoumen, Geert
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorVan Steenbergen, Jan
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.accessioned2021-10-16T01:38:12Z
dc.date.available2021-10-16T01:38:12Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10471
dc.source.beginpage75
dc.source.conferenceUltra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium
dc.source.conferencedate20/09/2004
dc.source.conferencelocationBrussel Belgium
dc.source.endpage78
dc.title

Performance of a linear single wafer IPA vapour based drying system

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions