The influence of wafer soaking and top coat processing on resist profile control in immersion lithography

dc.contributor.author	Foubert, Philippe
dc.contributor.author	Vandenbroeck, Nadia
dc.contributor.author	Delvaux, Christie
dc.contributor.author	Pollentier, Ivan
dc.contributor.author	Ercken, Monique
dc.contributor.imecauthor	Foubert, Philippe
dc.contributor.imecauthor	Vandenbroeck, Nadia
dc.contributor.imecauthor	Delvaux, Christie
dc.contributor.imecauthor	Pollentier, Ivan
dc.contributor.imecauthor	Ercken, Monique
dc.contributor.orcidimec	Pollentier, Ivan::0000-0002-4266-6500
dc.date.accessioned	2021-10-16T01:35:39Z
dc.date.available	2021-10-16T01:35:39Z
dc.date.issued	2005
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/10458
dc.source.conference	2nd International Symposium on Immersion Lithograpy
dc.source.conferencedate	12/09/2005
dc.source.conferencelocation	Brugge Belgium
dc.title	The influence of wafer soaking and top coat processing on resist profile control in immersion lithography
dc.type	Proceedings paper
dspace.entity.type	Publication
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