Publication:

Better prediction on patterning failure mode with hotspot aware OPC modeling

Date

2021
Proceedings Paper
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dc.contributor.authorWei, Chih-I
dc.contributor.authorWu, Stewart
dc.contributor.authorDeng, Yunfei
dc.contributor.authorKhaira, Gurdaman
dc.contributor.authorKusnadi, I.
dc.contributor.authorFenger, G.
dc.contributor.authorKang, S.
dc.contributor.authorOkamoto, Y.
dc.contributor.authorMaruyama, K.
dc.contributor.authorYamaszaki, Y.
dc.contributor.authorDas, Sayantan
dc.contributor.authorHalder, Sandip
dc.contributor.authorGillijns, Werner
dc.contributor.authorLorusso, Gian
dc.contributor.imecauthorWu, Stewart
dc.contributor.imecauthorDas, Sayantan
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorLorusso, Gian
dc.contributor.orcidimecDas, Sayantan::0000-0002-3031-0726
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.date.accessioned2021-10-31T12:42:17Z
dc.date.available2021-10-31T12:42:17Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/37372
dc.identifier.urlhttps://doi.org/10.1117/12.2583837
dc.source.beginpage1161112
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXIV
dc.source.conferencedate22/02/2021
dc.source.conferencelocationSan Jose, CA USA
dc.title

Better prediction on patterning failure mode with hotspot aware OPC modeling

dc.typeProceedings paper
dspace.entity.typePublication
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