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HF etching of Si-oxides and Si-nitrides for surface micromachining

Date

2001
Proceedings Paper
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dc.contributor.authorDu Bois, Bert
dc.contributor.authorVereecke, Guy
dc.contributor.authorWitvrouw, Ann
dc.contributor.authorDe Moor, Piet
dc.contributor.authorVan Hoof, Chris
dc.contributor.authorDe Caussemaeker, Ann
dc.contributor.authorVerbist, Agnes
dc.contributor.imecauthorDu Bois, Bert
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorDe Moor, Piet
dc.contributor.imecauthorVan Hoof, Chris
dc.contributor.orcidimecDu Bois, Bert::0000-0003-0147-1296
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.accessioned2021-10-14T16:53:45Z
dc.date.available2021-10-14T16:53:45Z
dc.date.issued2001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/5273
dc.source.beginpage131
dc.source.conferenceProceedings of the Sensor Technology Conference 2001
dc.source.conferencedate14/05/2001
dc.source.conferencelocationEnschede The Netherlands
dc.source.endpage136
dc.title

HF etching of Si-oxides and Si-nitrides for surface micromachining

dc.typeProceedings paper
dspace.entity.typePublication
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