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HfONx high-k layers deposited by MOCVD in mixed gas flows of N2O and O2
Publication:
HfONx high-k layers deposited by MOCVD in mixed gas flows of N2O and O2
Date
2003
Meeting abstract
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Zhao, Chao
;
Van Elshocht, Sven
;
Conard, Thierry
;
Xu, Zhen
;
Caymax, Matty
;
De Gendt, Stefan
;
Heyns, Marc
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Abstract
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1936
since deposited on 2021-10-15
1
last month
Acq. date: 2025-12-08
Citations
Metrics
Views
1936
since deposited on 2021-10-15
1
last month
Acq. date: 2025-12-08
Citations