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SOI thickness uniformity improvement using corrective etching for silicon nano-photonic device

Date

2011-09
Proceedings Paper
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dc.contributor.authorSelvaraja, Shankar
dc.contributor.authorRosseel, Erik
dc.contributor.authorFernandez, Luis
dc.contributor.authorTabat, Martin
dc.contributor.authorBogaerts, Wim
dc.contributor.authorHautala, John
dc.contributor.authorAbsil, Philippe
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorBogaerts, Wim
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.orcidimecBogaerts, Wim::0000-0003-1112-8950
dc.date.accessioned2021-10-19T18:40:21Z
dc.date.available2021-10-19T18:40:21Z
dc.date.embargo9999-12-31
dc.date.issued2011-09
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19761
dc.source.beginpage71
dc.source.conference8th International Conference in Group IV Photonics
dc.source.conferencedate14/09/2011
dc.source.conferencelocationLondon UK
dc.source.endpage73
dc.title

SOI thickness uniformity improvement using corrective etching for silicon nano-photonic device

dc.typeProceedings paper
dspace.entity.typePublication
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