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Advanced FinFET devices for sub-32nm technology nodes: characteristics and integration challenges

Date

2009
Meeting abstract
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dc.contributor.authorVeloso, Anabela
dc.contributor.authorCollaert, Nadine
dc.contributor.authorDe Keersgieter, An
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorRooyackers, Rita
dc.contributor.authorHoffmann, Thomas
dc.contributor.authorBiesemans, Serge
dc.contributor.authorJurczak, Gosia
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorDe Keersgieter, An
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecDe Keersgieter, An::0000-0002-5527-8582
dc.date.accessioned2021-10-18T04:36:55Z
dc.date.available2021-10-18T04:36:55Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16452
dc.source.beginpage935
dc.source.conference215th Electrochemical Society Spring Meeting
dc.source.conferencedate25/05/2009
dc.source.conferencelocationSan Francisco, CA USA
dc.title

Advanced FinFET devices for sub-32nm technology nodes: characteristics and integration challenges

dc.typeMeeting abstract
dspace.entity.typePublication
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