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Process study and characterization of VO2 thin films synthesized by ALD using TEMAV and O3 precursors
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Process study and characterization of VO2 thin films synthesized by ALD using TEMAV and O3 precursors
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Date
2012
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Peter, Antony
;
Toeller, Michael
;
Radu, Iuliana
;
Adelmann, Christoph
;
Schaekers, Marc
;
Meersschaut, Johan
;
Conard, Thierry
;
Van Elshocht, Sven
Journal
ECS Journal of Solid State Science and Technology
Abstract
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1974
since deposited on 2021-10-20
Acq. date: 2025-12-11
Citations
Metrics
Views
1974
since deposited on 2021-10-20
Acq. date: 2025-12-11
Citations