Publication:

Process study and characterization of VO2 thin films synthesized by ALD using TEMAV and O3 precursors

Date

2012
Journal article
Simple item page Full metadata Statistics
 
dc.contributor.authorPeter, Antony
dc.contributor.authorToeller, Michael
dc.contributor.authorRadu, Iuliana
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorSchaekers, Marc
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorConard, Thierry
dc.contributor.authorVan Elshocht, Sven
dc.contributor.imecauthorPeter, Antony
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-20T14:28:13Z
dc.date.available2021-10-20T14:28:13Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.issn2162-8769
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21286
dc.source.beginpageP169
dc.source.endpageP174
dc.source.issue4
dc.source.journalECS Journal of Solid State Science and Technology
dc.source.volume1
dc.title

Process study and characterization of VO2 thin films synthesized by ALD using TEMAV and O3 precursors

dc.typeJournal article
dspace.entity.typePublication
Files

Original bundle

Name:
24793.pdf
Size:
1.48 MB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Articles