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Atomic layer deposition: nucleation and growth behavior of HfO2 dielectrics on semiconductor surfaces
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1964 since deposited on 2021-10-18
1last month
Acq. date: 2025-12-16
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Metrics
Views
1964 since deposited on 2021-10-18
1last month
Acq. date: 2025-12-16
Citations