Patterning at the Resolution Limit of Commercial Electron Beam Lithography

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Author(s)

Saifullah, Mohammad S. M.

;

Asbahi, Mohamed

;

Neo, Darren C. J.

;

Mahfoud, Zackaria

;

;

;

Dwivedi, Neeraj

;

;

bin Dolmanan, Surani

;

;

;

Ganesan, Ramakrishnan

;

Tripathy, Sudhiranjan

;

Hasko, David G.

;

Valiyaveettil, Suresh

Journal

NANO LETTERS

Metrics

1555 since deposited on 2022-09-23

Acq. date: 2025-10-23