Publication:
Patterning at the Resolution Limit of Commercial Electron Beam Lithography
| dc.contributor.author | Saifullah, Mohammad S. M. | |
| dc.contributor.author | Asbahi, Mohamed | |
| dc.contributor.author | Neo, Darren C. J. | |
| dc.contributor.author | Mahfoud, Zackaria | |
| dc.contributor.author | Tan, Hui Ru | |
| dc.contributor.author | Ha, Son Tung | |
| dc.contributor.author | Dwivedi, Neeraj | |
| dc.contributor.author | Dutta, Tanmay | |
| dc.contributor.author | bin Dolmanan, Surani | |
| dc.contributor.author | Aabdin, Zainul | |
| dc.contributor.author | Bosman, Michel | |
| dc.contributor.author | Ganesan, Ramakrishnan | |
| dc.contributor.author | Tripathy, Sudhiranjan | |
| dc.contributor.author | Hasko, David G. | |
| dc.contributor.author | Valiyaveettil, Suresh | |
| dc.contributor.imecauthor | Asbahi, Mohamed | |
| dc.contributor.orcidimec | Asbahi, Mohamed::0000-0002-4442-6121 | |
| dc.date.accessioned | 2022-11-10T14:44:41Z | |
| dc.date.available | 2022-09-23T02:51:31Z | |
| dc.date.available | 2022-11-10T14:44:41Z | |
| dc.date.issued | 2022 | |
| dc.description.wosFundingText | ? ACKNOWLEDGMENTS This work was partially supported by the A * STAR Nano-imprint Foundry (Project Number 1525300037) . M.B. acknowledges support from the Singapore Ministry of Education Academic Research Fund Tier 2 (Project Number MOE2019-T2-1-179) . M.S.M.S. thanks Dr. Yasin Ekinci and Dr. Vitaliy Guzenko of the Paul Scherrer Institute for helpful discussions on lithography. The authors thank Mr. Poh Chong Lim and Ms. Debbie Seng of the Institute of Materials Research and Engineering (A * STAR) for their assistance in XRD and XPS, respectively. Dr. Susumu Ono?s (Elionix Inc., Japan) assistance with simulated and measured beam diameters of the Elionix ELS 7000 electron beam writer is gratefully acknowledged. | |
| dc.identifier.doi | 10.1021/acs.nanolett.2c02339 | |
| dc.identifier.issn | 1530-6984 | |
| dc.identifier.pmid | MEDLINE:36069429 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40487 | |
| dc.publisher | AMER CHEMICAL SOC | |
| dc.source.beginpage | 7432 | |
| dc.source.endpage | 7440 | |
| dc.source.issue | 18 | |
| dc.source.journal | NANO LETTERS | |
| dc.source.numberofpages | 9 | |
| dc.source.volume | 22 | |
| dc.subject.keywords | KNIFE-EDGE | |
| dc.subject.keywords | CDS | |
| dc.subject.keywords | DIAMETER | |
| dc.subject.keywords | PHOTOLUMINESCENCE | |
| dc.subject.keywords | FLUORESCENCE | |
| dc.subject.keywords | CLUSTERS | |
| dc.title | Patterning at the Resolution Limit of Commercial Electron Beam Lithography | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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