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Removal of high-dose ion-implanted 248nm deep UV photoresist using UV irradiation and organic solvent
Publication:
Removal of high-dose ion-implanted 248nm deep UV photoresist using UV irradiation and organic solvent
Date
2011
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Tsvetanova, Diana
;
Vos, Rita
;
Vanstreels, Kris
;
Radisic, Dunja
;
Sonnemans, Roger
;
Berry, Ivan
;
Waldfried, Carlo
;
Mattson, David
;
DeLuca, James
;
Vereecke, Guy
;
Mertens, Paul
;
Parac-Vogt, Tatjana
;
Heyns, Marc
Journal
Journal of the Electrochemical Society
Abstract
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1976
since deposited on 2021-10-19
439
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations
Metrics
Views
1976
since deposited on 2021-10-19
439
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations