Publication:

Removal of high-dose ion-implanted 248nm deep UV photoresist using UV irradiation and organic solvent

Date

2011
Journal article
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dc.contributor.authorTsvetanova, Diana
dc.contributor.authorVos, Rita
dc.contributor.authorVanstreels, Kris
dc.contributor.authorRadisic, Dunja
dc.contributor.authorSonnemans, Roger
dc.contributor.authorBerry, Ivan
dc.contributor.authorWaldfried, Carlo
dc.contributor.authorMattson, David
dc.contributor.authorDeLuca, James
dc.contributor.authorVereecke, Guy
dc.contributor.authorMertens, Paul
dc.contributor.authorParac-Vogt, Tatjana
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorTsvetanova, Diana
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.imecauthorRadisic, Dunja
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.accessioned2021-10-19T19:56:44Z
dc.date.available2021-10-19T19:56:44Z
dc.date.issued2011
dc.identifier.issn0013-4651
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19922
dc.source.beginpageH150
dc.source.endpageH155
dc.source.issue2
dc.source.journalJournal of the Electrochemical Society
dc.source.volume158
dc.title

Removal of high-dose ion-implanted 248nm deep UV photoresist using UV irradiation and organic solvent

dc.typeJournal article
dspace.entity.typePublication
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