Publication:

Thermal and plasma treatments for improved (Sub-)1nm EOT RMG high-k last devices

Date

2012-12
Meeting abstract
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dc.contributor.authorVeloso, Anabela
dc.contributor.authorArimura, Hiroaki
dc.contributor.authorSimoen, Eddy
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorShi, Xiaoping
dc.contributor.authorCho, Moon Ju
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorChew, Soon Aik
dc.contributor.authorVecchio, Emma
dc.contributor.authorSebaai, Farid
dc.contributor.authorRoussel, Philippe
dc.contributor.authorSantos, S. D.
dc.contributor.authorSchram, Tom
dc.contributor.authorHiguchi, Y.
dc.contributor.authorThean, Aaron
dc.contributor.authorHoriguchi, Naoto
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorArimura, Hiroaki
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorVecchio, Emma
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorThean, Aaron
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-20T18:12:57Z
dc.date.available2021-10-20T18:12:57Z
dc.date.issued2012-12
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21763
dc.source.conference43rd IEEE Semiconductor Interface Specialists Conference - SISC
dc.source.conferencedate6/12/2012
dc.source.conferencelocationSan Diego, CA USA
dc.title

Thermal and plasma treatments for improved (Sub-)1nm EOT RMG high-k last devices

dc.typeMeeting abstract
dspace.entity.typePublication
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