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Lateral solvent diffusion characterization of low k dielectric plasma damage and ALD barrier film closure
Publication:
Lateral solvent diffusion characterization of low k dielectric plasma damage and ALD barrier film closure
Date
2005
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Abell, Thomas
;
Schuhmacher, Jorg
;
Tokei, Zsolt
;
Travaly, Youssef
;
Maex, Karen
Journal
Microelectronic Engineering
Abstract
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1970
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations
Metrics
Views
1970
since deposited on 2021-10-16
Acq. date: 2025-10-23
Citations