Publication:

Lateral solvent diffusion characterization of low k dielectric plasma damage and ALD barrier film closure

Date

2005
Journal article
Simple item page Full metadata Statistics
 
dc.contributor.authorAbell, Thomas
dc.contributor.authorSchuhmacher, Jorg
dc.contributor.authorTokei, Zsolt
dc.contributor.authorTravaly, Youssef
dc.contributor.authorMaex, Karen
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorMaex, Karen
dc.date.accessioned2021-10-16T00:42:20Z
dc.date.available2021-10-16T00:42:20Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9993
dc.source.beginpage411
dc.source.endpage415
dc.source.issue3_4
dc.source.journalMicroelectronic Engineering
dc.source.volume82
dc.title

Lateral solvent diffusion characterization of low k dielectric plasma damage and ALD barrier film closure

dc.typeJournal article
dspace.entity.typePublication
Files
Publication available in collections:
Articles