Publication:
Optimized thermal processing for Ti-capped CoSi2 for 0.13μm technology
Date
| dc.contributor.author | Lindsay, Richard | |
| dc.contributor.author | Lauwers, A. | |
| dc.contributor.author | de Potter de ten Broeck, Muriel | |
| dc.contributor.author | Roelandts, Nico | |
| dc.contributor.author | Vrancken, Christa | |
| dc.contributor.author | Maex, Karen | |
| dc.contributor.imecauthor | de Potter de ten Broeck, Muriel | |
| dc.contributor.imecauthor | Vrancken, Christa | |
| dc.contributor.imecauthor | Maex, Karen | |
| dc.date.accessioned | 2021-10-14T13:16:42Z | |
| dc.date.available | 2021-10-14T13:16:42Z | |
| dc.date.issued | 2000 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/4535 | |
| dc.source.conference | Materials for Advanced Metallization Conference - MAM; February 28 - March 1, 2000; Stresa, Italy. | |
| dc.source.conferencelocation | ||
| dc.title | Optimized thermal processing for Ti-capped CoSi2 for 0.13μm technology | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |