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Optimal frequency range selection for full C-V characterization above 45MHz for ultra thin (1.2-nm) nitrided oxide MOSFETs

Date

2004
Proceedings Paper
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dc.contributor.authorJeamsaksiri, Wutthinan
dc.contributor.authorMercha, Abdelkarim
dc.contributor.authorRamos, Javier
dc.contributor.authorDecoutere, Stefaan
dc.contributor.authorCubaynes, Florence
dc.contributor.imecauthorMercha, Abdelkarim
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.orcidimecMercha, Abdelkarim::0000-0002-2174-6958
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.date.accessioned2021-10-15T14:03:12Z
dc.date.available2021-10-15T14:03:12Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/9094
dc.source.beginpage297
dc.source.conferenceProceedings of the International Conference on Microelectronic Test Structures - ICMTS
dc.source.conferencedate22/03/2004
dc.source.conferencelocationAwaji Japan
dc.source.endpage301
dc.title

Optimal frequency range selection for full C-V characterization above 45MHz for ultra thin (1.2-nm) nitrided oxide MOSFETs

dc.typeProceedings paper
dspace.entity.typePublication
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