Publication:

Accurate models for EUV simulation and their use for design correction

Date

2009
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorLorusso, Gian
dc.contributor.authorHermans, Jan
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorHendrickx, Eric
dc.contributor.authorKlostermann, Ulrich K.
dc.contributor.authorJang, Stephen
dc.contributor.authorZavyalova, Lena
dc.contributor.authorSorensen, Jacob
dc.contributor.authorGao, Weimin
dc.contributor.authorLucas, Kevin
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.date.accessioned2021-10-18T00:13:38Z
dc.date.available2021-10-18T00:13:38Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15752
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography
dc.source.conferencedate18/10/2009
dc.source.conferencelocationPrague Czech Republic
dc.title

Accurate models for EUV simulation and their use for design correction

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
18876.pdf
Size:
6.24 MB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions