Publication:

NA0.33 EUV extension for HVM: Testing single patterning limits

Date

2025
Proceedings Paper
https://doi.org/10.1117/12.3052244
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dc.contributor.authorLeray, Philippe
dc.contributor.authorDusa, Mircea
dc.contributor.authorLariviere, Stephane
dc.contributor.authorRoy, Syamashree
dc.contributor.authorBlanco, Victor
dc.contributor.authorVerstraete, Lander
dc.contributor.authorGupta, Mihir
dc.contributor.authorChowrira Poovanna, Bhavishya
dc.contributor.authorKim, Ryan Ryoung Han
dc.contributor.authorSuh, Hyo Seon
dc.contributor.authorHalder, Sandip
dc.contributor.authorLiu, Ru-Gun
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorDusa, Mircea
dc.contributor.imecauthorLariviere, Stephane
dc.contributor.imecauthorRoy, Syamashree
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorVerstraete, Lander
dc.contributor.imecauthorGupta, Mihir
dc.contributor.imecauthorPoovanna, Bhavishya Chowrira
dc.contributor.imecauthorKim, Ryoung-Han
dc.contributor.imecauthorSuh, HyoSeon
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorLiu, Ru-Gun
dc.contributor.orcidimecLeray, Philippe::0000-0002-1086-270X
dc.contributor.orcidimecDusa, Mircea::0009-0000-3384-8540
dc.contributor.orcidimecLariviere, Stephane::0009-0004-9271-2191
dc.contributor.orcidimecRoy, Syamashree::0009-0009-3247-3252
dc.contributor.orcidimecBlanco, Victor::0000-0003-4308-0381
dc.contributor.orcidimecVerstraete, Lander::0000-0002-3679-811X
dc.contributor.orcidimecGupta, Mihir::0000-0003-0286-7997
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.date.accessioned2025-07-31T03:59:31Z
dc.date.available2025-07-31T03:59:31Z
dc.date.issued2025
dc.identifier.doi10.1117/12.3052244
dc.identifier.eisbn978-1-5106-8635-9
dc.identifier.isbn978-1-5106-8634-2
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45973
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage1342403-1
dc.source.conference2025 Conference on Optical and EUV Nanolithography
dc.source.conferencedate2025-04-25
dc.source.conferencelocationSan Jose
dc.source.endpage1342403-7
dc.source.journalProceedings of SPIE
dc.source.numberofpages7
dc.title

NA0.33 EUV extension for HVM: Testing single patterning limits

dc.typeProceedings paper
dspace.entity.typePublication
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