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Conference contributions
Process window study of SAQP gratings used to pattern a dual damascene structure at 7nm technology node
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Process window study of SAQP gratings used to pattern a dual damascene structure at 7nm technology node
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Date
2016
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Decoster, Stefan
;
Paolillo, Sara
;
Kesters, Els
;
Briggs, Basoene
;
van der Veen, Marleen
;
Lazzarino, Frederic
;
Piumi, Daniele
;
Yamashita, Fumiko
;
Demand, Marc
;
Kumar, Kaushik
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1980
since deposited on 2021-10-23
Acq. date: 2025-12-10
Citations
Metrics
Views
1980
since deposited on 2021-10-23
Acq. date: 2025-12-10
Citations