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Advanced optical lithography: double patterning options for 32 and 22nm node
Publication:
Advanced optical lithography: double patterning options for 32 and 22nm node
Date
2009
Presentation
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vandeweyer, Tom
;
Maenhoudt, Mireille
;
Vangoidsenhoven, Diziana
;
Gronheid, Roel
;
Versluijs, Janko
;
Miller, Andy
;
Bekaert, Joost
;
Truffert, Vincent
;
Wiaux, Vincent
Journal
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Views
1980
since deposited on 2021-10-18
Acq. date: 2025-10-22
Citations
Metrics
Views
1980
since deposited on 2021-10-18
Acq. date: 2025-10-22
Citations