Publication:

Advanced optical lithography: double patterning options for 32 and 22nm node

Date

2009
Presentation
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dc.contributor.authorVandeweyer, Tom
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorVangoidsenhoven, Diziana
dc.contributor.authorGronheid, Roel
dc.contributor.authorVersluijs, Janko
dc.contributor.authorMiller, Andy
dc.contributor.authorBekaert, Joost
dc.contributor.authorTruffert, Vincent
dc.contributor.authorWiaux, Vincent
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorVangoidsenhoven, Diziana
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorMiller, Andy
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorTruffert, Vincent
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecTruffert, Vincent::0000-0001-7851-830X
dc.date.accessioned2021-10-18T04:30:22Z
dc.date.available2021-10-18T04:30:22Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16436
dc.source.conference2nd International Workshop on Plasma Etch and Strip in Microelectronics - PESM
dc.source.conferencedate26/02/2009
dc.source.conferencelocationLeuven Belgium
dc.title

Advanced optical lithography: double patterning options for 32 and 22nm node

dc.typeOral presentation
dspace.entity.typePublication
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