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Use of positive and negative chemically amplified resists in electron-beam direct-write lithography
Publication:
Use of positive and negative chemically amplified resists in electron-beam direct-write lithography
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Date
1995
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Tritchkov, Alexander
;
Jonckheere, Rik
;
Van den hove, Luc
Journal
J. Vac. Sci. Technol. B
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1940
since deposited on 2021-09-29
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Acq. date: 2025-12-16
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Views
1940
since deposited on 2021-09-29
1
last month
Acq. date: 2025-12-16
Citations