Publication:
Use of positive and negative chemically amplified resists in electron-beam direct-write lithography
Date
| dc.contributor.author | Tritchkov, Alexander | |
| dc.contributor.author | Jonckheere, Rik | |
| dc.contributor.author | Van den hove, Luc | |
| dc.contributor.imecauthor | Jonckheere, Rik | |
| dc.contributor.imecauthor | Van den hove, Luc | |
| dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
| dc.date.accessioned | 2021-09-29T13:18:04Z | |
| dc.date.available | 2021-09-29T13:18:04Z | |
| dc.date.issued | 1995 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/919 | |
| dc.source.beginpage | 2986 | |
| dc.source.endpage | 2993 | |
| dc.source.journal | J. Vac. Sci. Technol. B | |
| dc.source.volume | 13 | |
| dc.title | Use of positive and negative chemically amplified resists in electron-beam direct-write lithography | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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