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Low Resistance Stacked Via Metallization for Future Interconnects

 
dc.contributor.authorvan der Veen, Marleen
dc.contributor.authorFarokhnejad, Anita
dc.contributor.authorMandal, Akhilesh Kumar
dc.contributor.authorStruyf, Herbert
dc.contributor.authorPark, Seongho
dc.contributor.authorTokei, Zsolt
dc.contributor.imecauthorvan der Veen, Marleen H.
dc.contributor.imecauthorFarokhnejad, A.
dc.contributor.imecauthorMandal, A. Kumar
dc.contributor.imecauthorStruyf, H.
dc.contributor.imecauthorPark, S.
dc.contributor.imecauthorTokei, Z.
dc.date.accessioned2025-03-06T20:46:39Z
dc.date.available2025-03-06T20:46:39Z
dc.date.issued2024
dc.identifier.doi10.1109/IITC61274.2024.10732187
dc.identifier.eisbn979-8-3503-8517-5
dc.identifier.isbn979-8-3503-8518-2
dc.identifier.issn2380-632X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45343
dc.publisherIEEE
dc.source.conference2024 International Interconnect Technology Conference
dc.source.conferencedate2024-06-03
dc.source.conferencelocationSan Jose
dc.source.numberofpages3
dc.title

Low Resistance Stacked Via Metallization for Future Interconnects

dc.typeProceedings paper
dspace.entity.typePublication
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