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MOCVD growth of DH-HEMT buffers with low-temperature ALN interlayer on 200 mm Si (111) substrate for breakdown voltage enhancement
Publication:
MOCVD growth of DH-HEMT buffers with low-temperature ALN interlayer on 200 mm Si (111) substrate for breakdown voltage enhancement
Date
2015
Meeting abstract
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Zhao, Ming
;
Liang, Hu
;
Kandaswamy, Prem Kumar
;
Van Hove, Marleen
;
Venegas, Rafael
;
Vrancken, Evi
;
Favia, Paola
;
Vanderheyden, Annelies
;
Vanhaeren, Danielle
;
Saripalli, Yoga
;
Decoutere, Stefaan
;
Langer, Robert
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1922
since deposited on 2021-10-23
Acq. date: 2025-10-24
Citations
Metrics
Views
1922
since deposited on 2021-10-23
Acq. date: 2025-10-24
Citations