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MOCVD growth of DH-HEMT buffers with low-temperature ALN interlayer on 200 mm Si (111) substrate for breakdown voltage enhancement

Date

2015
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dc.contributor.authorZhao, Ming
dc.contributor.authorLiang, Hu
dc.contributor.authorKandaswamy, Prem Kumar
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorVenegas, Rafael
dc.contributor.authorVrancken, Evi
dc.contributor.authorFavia, Paola
dc.contributor.authorVanderheyden, Annelies
dc.contributor.authorVanhaeren, Danielle
dc.contributor.authorSaripalli, Yoga
dc.contributor.authorDecoutere, Stefaan
dc.contributor.authorLanger, Robert
dc.contributor.imecauthorZhao, Ming
dc.contributor.imecauthorLiang, Hu
dc.contributor.imecauthorVrancken, Evi
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorVanhaeren, Danielle
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.imecauthorLanger, Robert
dc.contributor.orcidimecZhao, Ming::0000-0002-0856-851X
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecVanhaeren, Danielle::0000-0001-8624-9533
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.contributor.orcidimecLanger, Robert::0000-0002-1132-3468
dc.date.accessioned2021-10-23T01:38:47Z
dc.date.available2021-10-23T01:38:47Z
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26249
dc.source.beginpageTuEO89
dc.source.conference11th International Conference on Nitride Semiconductors - ICNS-11
dc.source.conferencedate30/08/2015
dc.source.conferencelocationBeijing China
dc.title

MOCVD growth of DH-HEMT buffers with low-temperature ALN interlayer on 200 mm Si (111) substrate for breakdown voltage enhancement

dc.typeMeeting abstract
dspace.entity.typePublication
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