Publication:

Improved thermal stability of Ni-silicides on Si:C epitaxial layers

Date

2007
Journal article
Simple item page Full metadata Statistics
 
dc.contributor.authorMachkaoutsan, Vladimir
dc.contributor.authorMertens, Sofie
dc.contributor.authorBauer, R.
dc.contributor.authorLauwers, Anne
dc.contributor.authorVerheyden, Kurt
dc.contributor.authorVanormelingen, Koen
dc.contributor.authorVerheyen, Peter
dc.contributor.authorLoo, Roger
dc.contributor.authorCaymax, Matty
dc.contributor.authorJakschik, Stefan
dc.contributor.authorTheodore, D.
dc.contributor.authorAbsil, Philippe
dc.contributor.authorThomas, S.
dc.contributor.authorGranneman, E.H.A.
dc.contributor.imecauthorMachkaoutsan, Vladimir
dc.contributor.imecauthorMertens, Sofie
dc.contributor.imecauthorLauwers, Anne
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorAbsil, Philippe
dc.contributor.orcidimecMertens, Sofie::0000-0002-1482-6730
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.accessioned2021-10-16T17:43:20Z
dc.date.available2021-10-16T17:43:20Z
dc.date.embargo9999-12-31
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12530
dc.source.beginpage2542
dc.source.endpage2546
dc.source.journalMicroelectronic Engineering
dc.source.volume84
dc.title

Improved thermal stability of Ni-silicides on Si:C epitaxial layers

dc.typeJournal article
dspace.entity.typePublication
Files

Original bundle

Name:
15683.pdf
Size:
788.38 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Articles