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Circuit and process co-design with vertical gate-all-around nanowire FET technology to extend CMOS scaling for 5nm and beyond technologies
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1933 since deposited on 2021-10-22
3last month
2last week
Acq. date: 2025-12-08
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1933 since deposited on 2021-10-22
3last month
2last week
Acq. date: 2025-12-08
Citations