Spatially-separated atomic layer deposition of  Al2O3, a new option for high-throughput Si solar cell passivation

Publication:

2011

Proceedings Paper

Author(s)

;

Lorenz, Anne

;

Rothschild, Aude

;

;

;

1811 since deposited on 2021-10-19

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Acq. date: 2026-08-11