Publication:
Plasma etch challenges of Directed Self-Assembly (DSA) for fin and contact holes patterning in 7nm (N7) technology node
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1828 since deposited on 2021-10-22
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Acq. date: 2026-01-10
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Views
1828 since deposited on 2021-10-22
2last month
2last week
Acq. date: 2026-01-10
Citations