Publication:
Plasma etch challenges of Directed Self-Assembly (DSA) for fin and contact holes patterning in 7nm (N7) technology node
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1831 since deposited on 2021-10-22
3last month
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Acq. date: 2026-08-06
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Statistics
Views
1831 since deposited on 2021-10-22
3last month
1last week
Acq. date: 2026-08-06
Citations