Publication:
3D sequential low temperature top tier devices using dopant activation with excimer laser anneal and strained silicon as performance boosters
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1966 since deposited on 2021-11-02
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Acq. date: 2025-10-25
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Views
1966 since deposited on 2021-11-02
443item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations