Publication:

Deposition Of Ru and RuO2 flms for DRAM electrode

Date

2010
Meeting abstract
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dc.contributor.authorSchaekers, Marc
dc.contributor.authorCapon, B.
dc.contributor.authorDetavernier, C.
dc.contributor.authorBlasco, N.
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.date.accessioned2021-10-18T21:19:41Z
dc.date.available2021-10-18T21:19:41Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17953
dc.source.beginpage1425
dc.source.conference218th ECS Meeting Symposium 'Atomic Layer Deposition Applications 6'
dc.source.conferencedate10/10/2010
dc.source.conferencelocationLas Vegas, NV USA
dc.title

Deposition Of Ru and RuO2 flms for DRAM electrode

dc.typeMeeting abstract
dspace.entity.typePublication
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