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Damage-free removal of nano-sized particles, heading towards a red brick wall

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dc.contributor.authorMertens, Paul
dc.contributor.authorFyen, Wim
dc.contributor.authorVereecke, Guy
dc.contributor.authorXu, Kaidong
dc.contributor.authorLauerhaas, J.
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorVan Doorne, Patrick
dc.contributor.authorKesters, Els
dc.contributor.authorVos, Rita
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorVos, Rita
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.accessioned2021-10-15T05:44:03Z
dc.date.available2021-10-15T05:44:03Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7899
dc.source.conferenceInternational Sematech Wafer Cleaning and Surface Preparation Workshop
dc.source.conferencedate1/05/2003
dc.source.conferencelocationAustin, TX USA
dc.title

Damage-free removal of nano-sized particles, heading towards a red brick wall

dc.typeOral presentation
dspace.entity.typePublication
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