Status of EUV lithography at IMEC

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Author(s)

Goethals, Mieke

;

Jonckheere, Rik

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Van Roey, Frieda

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;

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Niroomand, Ardavan

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;

Stepanenko, Nickolay

;

Journal

Journal of Photopolymer Science & Technology

Metrics

1929 since deposited on 2021-10-16

Acq. date: 2025-10-23